Immersion Lithography Wafer
September 11th, 2010
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Toppan Completes 22nm and 20nm Production Photomask Process Through Toppan-IBM Joint Development
TOKYO—-Toppan Printing Co., Ltd. today announced that it has developed a photomask manufacturing process at its facility in Asaka, Japan, to support 22nm and 20nm semiconductor device production.