Semiconductor Lithography Process
My sub-micron lithography is expected to achieve domestic
China’s first world-leading level, with independent intellectual property rights of direct-write lithography be available at the end of December in Hefei, indicates that China submicron lithography situation entirely dependent on imports will be broken.
It is learned from the master core semiconductor (Hefei) Co., Ltd production of two prototype direct-write lithography has entered the final stages of assembly debugging, the resolution of sub-micron level, from the resolution of two major performance and capacity considerations , and now in this area of Japan and Germany advanced than similar products, core products in the world’s leading master’s level.
Lithography is the semiconductor device in one of the most critical equipment, each generation of semiconductor technology to lithography line width are represented. But in China, production lithography entirely dependent on imports and domestic brands of sub-micron lithography is still blank. Master core semiconductor company’s direct-write lithography is the only commercial direct-write lithography technology with independent intellectual property rights in China, will China’s development of lithography technology to lay a solid foundation.
About lithography
The manufacture of optical integrated circuits – Principles of chemical reactions and chemical, physical etching method, the circuit diagram delivered to the surface or a dielectric layer on single crystal form or function of effective graphics window graphics technology. With the development of semiconductor technology, lithography technology transfer size limit reduced graph 2 to 3 orders of magnitude (from the millimeter to sub-micron level), from the conventional optical technology to the application of electron beam, X-ray, micro-ion beam, laser and other new technologies; use wavelengths from 4000 to Egypt and expand the scope of 0.1 angstroms. Lithography technology as a sophisticated microfabrication techniques.
Conventional lithography is used wavelength UV Egypt from 2000 to 4500 as the image information carrier and photoresist as intermediate (image record) media to achieve the transformation graph, transfer and processing of image data ultimately delivered to the chip ( mainly refers to silicon), or dielectric layer on a process (Figure 1). In a broad sense, which includes copying and etching light two main aspects.
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